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137
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ICCAD
2009
IEEE
151views Hardware» more  ICCAD 2009»
15 years 1 months ago
GREMA: Graph reduction based efficient mask assignment for double patterning technology
Double patterning technology (DPT) has emerged as the most hopeful candidate for the next technology node of the ITRS roadmap [1]. The goal of a DPT decomposer is to decompose the...
Yue Xu, Chris Chu
157
Voted
TON
2010
126views more  TON 2010»
14 years 10 months ago
MAC Scheduling With Low Overheads by Learning Neighborhood Contention Patterns
Aggregate traffic loads and topology in multi-hop wireless networks may vary slowly, permitting MAC protocols to `learn' how to spatially coordinate and adapt contention patte...
Yung Yi, Gustavo de Veciana, Sanjay Shakkottai
119
Voted
TVLSI
2010
14 years 10 months ago
Pattern Sensitive Placement Perturbation for Manufacturability
The gap between VLSI technology and fabrication technology leads to strong refractive effects in lithography. Consequently, it is a huge challenge to reliably print layout features...
Shiyan Hu, Patrik Shah, Jiang Hu
166
Voted
GSEM
2004
Springer
15 years 9 months ago
The Grid-Occam Project
Occam is a parallel processing language designed by a team at INMOS in conjunction with the design of the transputer processor, and based on Sir T. Hoare's ideas of Communica...
Peter Tröger, Martin von Löwis, Andreas ...
135
Voted
SIGCSE
2002
ACM
229views Education» more  SIGCSE 2002»
15 years 3 months ago
GraphicsMentor: a tool for learning graphics fundamentals
This paper discusses the functionality of GraphicsMentor. GraphicsMentor permits a student to modify many parameters of the camera, objects, and light sources interactively, and t...
Dejan Nikolic, Ching-Kuang Shene