In this paper we introduce a new class of diffeomorphic smoothers based on general spline smoothing techniques and on the use of some tools that have been recently developed in th...
Starting from the 90nm technology node, process induced stress has played a key role in the design of highperformance devices. The emergence of source/drain silicon germanium (S/D ...
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
In this paper, we study the problem of supporting multicast traffic in wireless sensor networks with network coding. On one hand, coding operations can reduce power consumption and...
Abstract—MapReduce is emerging as a generic parallel programming paradigm for large clusters of machines. This trend combined with the growing need to run machine learning (ML) a...
Amol Ghoting, Rajasekar Krishnamurthy, Edwin P. D....