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SIAMNUM
2010
126views more  SIAMNUM 2010»
14 years 4 months ago
Smoothing under Diffeomorphic Constraints with Homeomorphic Splines
In this paper we introduce a new class of diffeomorphic smoothers based on general spline smoothing techniques and on the use of some tools that have been recently developed in th...
Jérémie Bigot, Sébastien Gada...
TCAD
2010
88views more  TCAD 2010»
14 years 4 months ago
Stress Aware Layout Optimization Leveraging Active Area Dependent Mobility Enhancement
Starting from the 90nm technology node, process induced stress has played a key role in the design of highperformance devices. The emergence of source/drain silicon germanium (S/D ...
Ashutosh Chakraborty, Sean X. Shi, David Z. Pan
TCAD
2010
194views more  TCAD 2010»
14 years 4 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
TWC
2010
14 years 4 months ago
Lifetime-resource tradeoff for multicast traffic in wireless sensor networks
In this paper, we study the problem of supporting multicast traffic in wireless sensor networks with network coding. On one hand, coding operations can reduce power consumption and...
Vahid Shah-Mansouri, Vincent W. S. Wong
99
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ICDE
2011
IEEE
258views Database» more  ICDE 2011»
14 years 1 months ago
SystemML: Declarative machine learning on MapReduce
Abstract—MapReduce is emerging as a generic parallel programming paradigm for large clusters of machines. This trend combined with the growing need to run machine learning (ML) a...
Amol Ghoting, Rajasekar Krishnamurthy, Edwin P. D....