1963 search results - page 280 / 393 » The Maximum Solution Problem on Graphs |
156
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TCAD
2010
14 years 7 months ago
2010
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
88
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CVPR
2008
IEEE
16 years 2 months ago
2008
IEEE
Most algorithms for real-time tracking of deformable shapes provide sub-optimal solutions for a suitable energy minimization task: The search space is typically considered too lar...
111
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COMBINATORICA
2007
15 years 19 days ago
2007
The standard Erd˝os-Renyi model of random graphs begins with n isolated vertices, and at each round a random edge is added. Parametrizing n 2 rounds as one time unit, a phase tra...
114
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ICCV
2009
IEEE
16 years 5 months ago
2009
IEEE
Geometric rearrangement of images includes operations
such as image retargeting, inpainting, or object rearrangement.
Each such operation can be characterized by a shiftmap:
the...
96
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ICDM
2008
IEEE
15 years 7 months ago
2008
IEEE
Recently Non-negative Matrix Factorization (NMF) has received a lot of attentions in information retrieval, computer vision and pattern recognition. NMF aims to find two non-nega...