With the ever-increasing transistor variability in CMOS technology, it is essential to integrate variation-aware performance analysis into the task allocation and scheduling proce...
We present a novel detailed placement technique that accounts for systematic through-pitch variations to reduce leakage. Leakage depends nearly exponentially on linewidth (gate le...
We describe here a method for automatically identifying word sense variation in a dated collection of historical books in a large digital library. By leveraging a small set of kno...
Abstract. This paper presents a variational level set approach to joint segmentation and bias correction of images with intensity inhomogeneity. Our method is based on an observati...
Chunming Li, Rui Huang, Zhaohua Ding, Chris Gat...
Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...