SRAM cell design is driven by the need to satisfy static noise margin, write margin and read current margin (RCM) over all cells in the array in an energy-efficient manner. These ...
Ashish Kumar Singh, Ku He, Constantine Caramanis, ...
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
Modern circuits become harder to route with the ever decreasing design features. Previous routability-driven placement techniques are usually tightly coupled with the underlying p...
Multi-core processors have become an integral part of mainstream high performance computer systems. In parallel, exponentially increasing power density and packaging costs have ne...
This work considers the problem of estimating the epipolar geometry between two cameras without needing a prespecified set of correspondences. It is capable of resolving the epipo...