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    SLIP
    2009
    ACM
    175views Computer Networks» more  SLIP 2009»
    Is overlay error more important than interconnect variations in double patterning?
    15 years 9 months ago
    Is overlay error more important than interconnect variations in double patterning?
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    Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
    Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
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