—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
—This paper studies a natural formulation of the timing-driven maze routing problem. A multigraph model appropriate for global routing applications is adopted; the model naturall...
A multi-object operation incurs communication or synchronization overhead when the requested objects are distributed over different nodes. The object pair correlations (the probab...
Part-of-speech (POS) tag distributions are known to exhibit sparsity -- a word is likely to take a single predominant tag in a corpus. Recent research has demonstrated that incorp...
The observations in many applications consist of counts of discrete events, such as photons hitting a detector, which cannot be effectively modeled using an additive bounded or Ga...
Zachary T. Harmany, Roummel F. Marcia, Rebecca Wil...