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» On Computability of Pattern Recognition Problems
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DAC
2000
ACM
15 years 9 months ago
Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
Ruiqi Tian, D. F. Wong, Robert Boone
144
Voted
IJIT
2004
15 years 6 months ago
Adaptive Algorithm to Predict the QoS of Web Processes and Workflows
Workflow Management Systems (WfMS) allow organizations to streamline and automate business processes and reengineer their structure. One important requirement for this type of syst...
Jorge Cardoso
SSWMC
2004
15 years 6 months ago
Hiding correlation-based watermark templates using secret modulation
A possible solution to the difficult problem of geometrical distortion of watermarked images in a blind watermarking scenario is to use a template grid in the autocorrelation func...
Jeroen Lichtenauer, Iwan Setyawan, Reginald L. Lag...
IPPS
2010
IEEE
15 years 2 months ago
Head-body partitioned string matching for Deep Packet Inspection with scalable and attack-resilient performance
Abstract--Dictionary-based string matching (DBSM) is a critical component of Deep Packet Inspection (DPI), where thousands of malicious patterns are matched against high-bandwidth ...
Yi-Hua E. Yang, Viktor K. Prasanna, Chenqian Jiang
114
Voted
ACL
2009
15 years 2 months ago
A Ranking Approach to Stress Prediction for Letter-to-Phoneme Conversion
Correct stress placement is important in text-to-speech systems, in terms of both the overall accuracy and the naturalness of pronunciation. In this paper, we formulate stress ass...
Qing Dou, Shane Bergsma, Sittichai Jiampojamarn, G...